Eigenstrain-Based Simulation of Powder Bed–Type Additive Manufacturing Processes

Special-purpose techniques and user subroutines are available for eigenstrain-based simulation of powder bed–type additive manufacturing processes. These internal built-in user subroutines are accessed by starting names and types with "ABQ_" as described below.

This page discusses:

Eigenstrain-based simulation of powder bed–type processes can be simulated using the pattern-based method or the trajectory-based method. In the trajectory-based method, the path of the movement of the laser spot is used to determine the time of activation of an element and the eigenstrain to apply to the element at the time of its activation. In the pattern-based method, a scan pattern, which represents an idealized motion of the laser, is used to determine the time of activation of an element and the eigenstrain to assign to that element (see Scan Pattern–Mesh Intersection).

Specifying Element Activation and Eigenstrain Using the Pattern-Based Method

The following steps are required to use the pattern-based eigenstrain method:

A dedicated collection of parameter table, property table, and event series types is available to include all of the definitions required by special-purpose techniques for additive manufacturing. You can use the abaqus fetch utility to obtain the file containing all of the type definitions of parameter tables, property tables, and event series required by the special-purpose techniques for additive manufacturing as follows:

abaqus fetch job=ABQ_am_special_purpose_types.inp

Visualization of a Scan Pattern

A scan pattern can be visualized over the part geometry by requesting element solution-dependent field variables for output and plotting them as contours over the finite element mesh. For a pattern-based eigenstrain analysis, the first two element solution-dependent field variables are internally set to the patch ID and scan region ID, respectively (see Figure 1). For a trajectory-based eigenstrain analysis, the first element solution-dependent field variable is internally set to the rule ID.

Quilt-style contour plots of scan pattern island ID and scanning region ID.

Specifying Element Activation and Eigenstrain Using the Trajectory-Based Method

The following steps are required to use the trajectory-based method: